Please use this identifier to cite or link to this item: https://elib.psu.by/handle/123456789/22829
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dc.contributor.authorAntonovich, D.en_EN
dc.contributor.authorGruzdev, V.en_EN
dc.contributor.authorZalesski, V.en_EN
dc.contributor.authorPobol, I.en_EN
dc.contributor.authorSoldatenko, P.en_EN
dc.date.accessioned2018-11-16T07:43:51Z-
dc.date.available2018-11-16T07:43:51Z-
dc.date.issued2017-
dc.identifier.citationAntonovich, D. Plasma emission systems for electron- and ion-beam technologies/ D. Antonovich, V. Gruzdev, V. Zalesski, I. Pobol, P. Soldatenko // High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes – 2017. - Vol. 21, Iss. 2. – P. 143-159ru_RU
dc.identifier.urihttps://elib.psu.by/handle/123456789/22829-
dc.description.abstractDesigns and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed.ru_RU
dc.language.isoenru_RU
dc.publisherBegell House Inc-
dc.subjectPlasma electron sourceen_EN
dc.subjectLow-energy beamsen_EN
dc.subjectCombined ion and electron beamsen_EN
dc.subjectElectron-beams technologiesen_EN
dc.titlePlasma emission systems for electron- and ion-beam technologiesru_RU
dc.title.alternativeСистемы плазменной эмиссии для электронно-ионно-лучевых технологийru_RU
dc.typeArticleru_RU
dc.identifier.doi10.1615/HighTempMatProc.2017024672-
Appears in Collections:Электрофизика. Плазменные эмиссионные системы.
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