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https://elib.psu.by/handle/123456789/22829
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DC Field | Value | Language |
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dc.contributor.author | Antonovich, D. | en_EN |
dc.contributor.author | Gruzdev, V. | en_EN |
dc.contributor.author | Zalesski, V. | en_EN |
dc.contributor.author | Pobol, I. | en_EN |
dc.contributor.author | Soldatenko, P. | en_EN |
dc.date.accessioned | 2018-11-16T07:43:51Z | - |
dc.date.available | 2018-11-16T07:43:51Z | - |
dc.date.issued | 2017 | - |
dc.identifier.citation | Antonovich, D. Plasma emission systems for electron- and ion-beam technologies/ D. Antonovich, V. Gruzdev, V. Zalesski, I. Pobol, P. Soldatenko // High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes – 2017. - Vol. 21, Iss. 2. – P. 143-159 | ru_RU |
dc.identifier.uri | https://elib.psu.by/handle/123456789/22829 | - |
dc.description.abstract | Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed. | ru_RU |
dc.language.iso | en | ru_RU |
dc.publisher | Begell House Inc | - |
dc.subject | Plasma electron source | en_EN |
dc.subject | Low-energy beams | en_EN |
dc.subject | Combined ion and electron beams | en_EN |
dc.subject | Electron-beams technologies | en_EN |
dc.title | Plasma emission systems for electron- and ion-beam technologies | ru_RU |
dc.title.alternative | Системы плазменной эмиссии для электронно-ионно-лучевых технологий | ru_RU |
dc.type | Article | ru_RU |
dc.identifier.doi | 10.1615/HighTempMatProc.2017024672 | - |
Appears in Collections: | Электрофизика. Плазменные эмиссионные системы. Публикации в Scopus и Web of Science |
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File | Description | Size | Format | |
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Antonovich_Plasma.pdf | 155.28 kB | Adobe PDF | View/Open |
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