Please use this identifier to cite or link to this item: https://elib.psu.by/handle/123456789/22829
Title: Plasma emission systems for electron- and ion-beam technologies
Authors: Antonovich, D.
Gruzdev, V.
Zalesski, V.
Pobol, I.
Soldatenko, P.
Other Titles: Системы плазменной эмиссии для электронно-ионно-лучевых технологий
Issue Date: 2017
Publisher: Begell House Inc
Citation: Antonovich, D. Plasma emission systems for electron- and ion-beam technologies/ D. Antonovich, V. Gruzdev, V. Zalesski, I. Pobol, P. Soldatenko // High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes – 2017. - Vol. 21, Iss. 2. – P. 143-159
Abstract: Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed.
Keywords: Plasma electron source
Low-energy beams
Combined ion and electron beams
Electron-beams technologies
URI: https://elib.psu.by/handle/123456789/22829
metadata.dc.identifier.doi: 10.1615/HighTempMatProc.2017024672
Appears in Collections:Электрофизика. Плазменные эмиссионные системы.
Публикации в Scopus и Web of Science

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