Please use this identifier to cite or link to this item: https://elib.psu.by/handle/123456789/49749
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dc.contributor.authorProsolovich, V.-
dc.contributor.authorBrinkevich, D.-
dc.contributor.authorGrinyuk, E.-
dc.contributor.authorYankovskii, Yu.-
dc.contributor.authorZubova, O.-
dc.contributor.authorBrinkevich, S.-
dc.contributor.authorVabishchevich, S.-
dc.date.accessioned2026-03-27T08:34:37Z-
dc.date.available2026-03-27T08:34:37Z-
dc.date.issued2026-
dc.identifier.citationProsolovich, V.S., Brinkevich, D.I., Grinyuk, E.V. et al. Stabilizing Treatment of Negative Photoresist Films of the AZ nLOF20XX Series on Silicon. Russ Microelectron 54, 589–594 (2025). https://doi.org/10.1134/S106373972560089Xru_RU
dc.identifier.urihttps://elib.psu.by/handle/123456789/49749-
dc.language.isoenru_RU
dc.publisherSpringer Natureru_RU
dc.titleStabilizing Treatment of Negative Photoresist Films of the AZ nLOF20XX Series on Siliconru_RU
dc.typeArticleru_RU
dc.identifier.doi10.1134/S106373972560089X-
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