Please use this identifier to cite or link to this item:
https://elib.psu.by/handle/123456789/22829
Title: | Plasma emission systems for electron- and ion-beam technologies |
Authors: | Antonovich, D. Gruzdev, V. Zalesski, V. Pobol, I. Soldatenko, P. |
Other Titles: | Системы плазменной эмиссии для электронно-ионно-лучевых технологий |
Issue Date: | 2017 |
Publisher: | Begell House Inc |
Citation: | Antonovich, D. Plasma emission systems for electron- and ion-beam technologies/ D. Antonovich, V. Gruzdev, V. Zalesski, I. Pobol, P. Soldatenko // High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes – 2017. - Vol. 21, Iss. 2. – P. 143-159 |
Abstract: | Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed. |
Keywords: | Plasma electron source Low-energy beams Combined ion and electron beams Electron-beams technologies |
URI: | https://elib.psu.by/handle/123456789/22829 |
metadata.dc.identifier.doi: | 10.1615/HighTempMatProc.2017024672 |
Appears in Collections: | Электрофизика. Плазменные эмиссионные системы. Публикации в Scopus и Web of Science |
Files in This Item:
File | Description | Size | Format | |
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Antonovich_Plasma.pdf | 155.28 kB | Adobe PDF | View/Open |
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